Cell membrane integrity, callose accumulation, and root growth in aluminum-stressed sorghum seedlings

dc.contributor.authorEmily Jepkosgei Too
dc.contributor.authorBeatrice Ang’iyo Were
dc.contributor.authorOnkware, Augustino
dc.contributor.authorAnders S. Carlsson
dc.contributor.authorMulatu Geleta
dc.contributor.authorGudu, Samuel
dc.contributor.authorT. Bryngelsson
dc.date.accessioned2015-08-21T09:10:44Z
dc.date.available2015-08-21T09:10:44Z
dc.date.issued2015-08-21
dc.description.abstractAluminum stress usually reduces plant root growth due to the accumulation of Al in specific zones of the root apex. The objectives of this study were to determine the localization of Al in the root apex of Sorghum bicolor (L.) Moech. and its effects on membrane integrity, callose accumulation, and root growth in selected cultivars. Seedlings were grown in a nutrient solution containing 0, 27, or 39 μM Al3+ for 24, 48, and 120 h. The Al stress significantly reduced root growth, especially after 48 and 120 h of exposure. A higher Al accumulation, determined by fluorescence microscopy after staining with a Morin dye, occurred in the root extension zone of the sensitive cultivar than in the tolerant cultivar. The membrane damage and callose accumulation were also higher in the sensitive than resistant cultivar. It was concluded that the Al stress significantly reduced root growth through the accumulation of Al in the root extension zone, callose accumulation, and impairment of plasma membrane integrity.en_US
dc.identifier.urihttp://repository.rongovarsity.ac.ke/handle/123456789/449
dc.language.isoenen_US
dc.titleCell membrane integrity, callose accumulation, and root growth in aluminum-stressed sorghum seedlingsen_US
dc.title.alternativeCell membrane integrity, callose accumulation, and root growth in aluminum-stressed sorghum seedlings.pdfen_US
dc.title.alternativeT. BRYNGELSSON2 anden_US
dc.title.alternativeCell membrane integrity, callose accumulation, and root growth in aluminum-stressed sorghum seedlingsen_US
dc.typeArticleen_US

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